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article · 2004

A rapid chemical diagnostic method to detect silicon oxide and TiN residues on aluminum bondpads in wafer fabrication

Silicon oxide and TiN residues on Al bondpads will result in non-stick bondpad problem at assembly process. Currently, EDX and Auger analysis techniques are ...

1 citationsDOI: https://doi.org/10.1109/smelec.2002.1217800
A rapid chemical diagnostic method to detect silicon oxide and TiN residues on aluminum bondpads in wafer fabrication