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article · 2000

Reaction control of tetraethyl orthosilicate (TEOS)/O3 and tetramethyl orthosilicate (TMOS)/O3 counter diffusion chemical vapour deposition for preparation of molecular-sieve membranes

Counter diffusion chemical vapour deposition (CVD) is an excellent way to prepare inorganic thin films or membranes on the surface of porous or non-porous su...

37 citationsDOI: https://doi.org/10.1039/b004642f
Reaction control of tetraethyl orthosilicate (TEOS)/O3 and tetramethyl orthosilicate (TMOS)/O3 counter diffusion chemical vapour deposition for preparation of molecular-sieve membranes