article · 2010
Gas Assisted E-beam Lithography Using the JSM-7600F Ultra-High Resolution Schottky FEG-SEM and OmniGIS
Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.
2 citationsDOI: https://doi.org/10.1017/s1431927610059581