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article · 2002

Attenuated phase shift masks using MoSi as an opaque layer

The use of phase shifting masks (PSM) causes revolutionary improvements of the performance of existing wafer steppers. Nowadays the attenuated PSM, also refe...

1 citationsDOI: https://doi.org/10.1109/smicnd.1995.494890
Attenuated phase shift masks using MoSi as an opaque layer