article · 2003
Low RF loss and noise of transmission lines on Si substrates using an improved ion implantation process
Very low power loss /spl les/0.6 dB at 110 GHz and noise of <0.25 dB at 18 GHz have been measured on transmission lines fabricated on Si substrates and impla...
17 citationsDOI: https://doi.org/10.1109/mwsym.2003.1212529